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titileA study of aluminum oxide thin films prepared by atmospheric-pressure chemical vapor deposition from trimethylaluminum + oxygen and/or nitrous oxide
Journal of Electronic Materials
Volume 17, Number 6, 509-517, DOI: 10.1007/BF02652101
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ww.springerlink.com/content/k3738t1757661065/ {:5_355:} 给你发过去了~{:4_295:} 已经收到,谢谢楼上这位
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